介质膜,dielectric film
1)dielectric film介质膜
1.The condition to design reflection reducing coating studied by analyzing the character matrix of thedielectric film;利用介质膜特性矩阵讨论介质膜的增透条件
2.The microscopical composition structure and its relationship to fabricated film process of SiO_xN_ydielectric film in nanometre range formed by low temperature PECVD were analysed with Anger electron spectrum (AES) and Fourier transform infrared spectroscopy (FTIR).采用俄歇电子能谱 ( AES)和傅里叶红外光谱 ( FTIR)分析低温 PECVD法形成纳米级 Si Ox Ny介质膜的微观组分结构及其与制膜工艺间关系 ,通过椭圆偏振技术测试该薄膜的物理光学性能。
3.In this paper, the feasibility of using SiO 2 asdielectric film for AC PDP is studied, SiO 2 film prepared by electron beam evaporation is analysed with TEM.并对电子束蒸发制备的 Ｓｉ Ｏ２介质膜进行了微观分析。
英文短句/例句
1.Study on the Characteristic of Appearance of Multilayer Dielectric Grating Mask;多层介质膜光栅掩膜形貌特性的研究
2.light reflector coated with dielectric diaphragm介质膜反光镜（用于放样机）
3.Preparation and Research on Dielectric Films with High Damage Threshold;高损伤阈值介质膜层的制备及其研究
4.Effect of Dielectric and Surface Treating on the Characteristic of GaN HEMT介质膜性质及表面处理对GaN HEMT特性的影响
5.film dielectric variable capacitor薄膜介质可变电容器
anic film capacitor有机薄膜介质电容器
7.anodized dielectric film阳极氧化的介质薄膜
8.Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film高介电栅介质ZrO_2薄膜的物理电学性能
9.Study of Mechanical and Optical Characteristic in Film/substrate System for Dielectric Thin Film;介质薄膜膜基体系力学光学特性研究
10.Research on the Optical Properties of Dielectric Single-layers and Surface Defects of Multi-layers;介质单层膜光学特性及多层膜表面缺陷的研究
11.Research on the Fabrication of High-k Dielectric Films and the Discussion of Integrated Thin Film Capacitor;高k电介质薄膜制备研究与集成薄膜电容探讨
12.Interface roughness of multilayer dielectric optical thin film多层介质薄膜膜层间界面粗糙度及光散射
13.film dielectric four-gang variable capacitor薄膜介质四连可变电容器
14.film super-small variable capacitor薄膜介质超小型可变电容器
15.Study on Deposition of Diamond-Like Carbon Films by Dielectric Barrier Discharge;介质阻挡放电制备类金刚石膜的研究
16.Investigation on preparation,Structure and dielectric properties of amorphous fluorinated carbon films;α-C：F薄膜的沉积、结构与介电性质研究
17.Study on the Thick-film EMI Filter X7R Dielectric Ceramic;厚膜EMI滤波器X7R介质瓷料的研究
18.Preparation and Photoelectric Properties of TiO_2 Mesoporous Thin FilmsTiO_2介孔薄膜的制备及其光电性质研究
相关短句/例句
medium film介质膜
1.This paper obtains the main parameters of the quarter wave plate by theoretical analysis of Fresnel formal and the character metrix ofmedium film.利用介质膜特性矩阵和涅耳公式对反射型 1/ 4波片的主要参数进行计算 ,以使入射的线偏光经介质膜反射后变成圆偏
3)thick-film dielectric厚膜介质
1.The CaO-Al_2O_3-SiO_2 ceramic-glass was used forthick-film dielectric.以CaO-Al_2O_3-SiO_2(CAS)系微晶玻璃作为厚膜介质,研究CAS系微晶玻璃中形核剂的选择,以及形核剂对CAS玻璃的软化温度与析晶温度的影响规律,使其烧成温度与析晶温度满足厚膜电路850℃标准烧成工艺的要求;并简单分析形核剂的作用机理。
4)filming medium成膜介质
1.Effect offilming medium and reducing agents on the properties of soy p rotein isolate film (SPI) was studied.研究了成膜介质和还原剂对大豆分离蛋白膜(SPI)性能的影响。
5)Ta_2O_5 dielectric filmsTa_2O_5介质膜
6)Dielectric film介质薄膜
1.In this paper, a theoretical model of long-pulse laser leading to thermal stress damageof dielectric film in film/substrate systems is developed.本文用有限元法研究并建立了长脉冲激光对介质薄膜热应力损伤的理论模型，在该模型的基础上模拟了介质薄膜和基底中的温度场和热应力场瞬态分布，分析了长脉冲激光对介质薄膜的热应力损伤的机理。
2.The damage mechanisms and characteristics of dielectric films under the irradiation of the long pulse laser are studied in this paper.本文从理论和实验方面研究了长脉冲激光对介质薄膜的损伤机理和特性,并对波长为1064nm的长脉冲激光产生的损伤阈值进行了测试研究。
延伸阅读
电解食盐水溶液离子膜电解槽所用的膜材料之一分子式：CAS号：性质：又称全氟羧酸-磺酸复合离子膜 Rf-COOH-Rf-SO3H 电解食盐水溶液离子膜电解槽所用的膜材料之一。使用时，将较薄的羧酸层面向阴极，较厚的磺酸层面向阳极，因而兼有羧酸膜和磺酸膜的优点。由于Rf-COOH层的存在，可阻挡氢氧离子返迁移到阳极室，确保了高的电流效率（96%），因Rf-SO3层的电阻低，能在高电流密度下运行，且阴极液可用盐酸中和，产品氯气中氧含量低，氢氧化钠浓度可达33%～35%。可在全氟磺酸膜上涂敷一层全氟羧酸的聚合物，或是将磺酸膜和羧酸膜进行层压，或是采用化学方法处理而制得的复合膜。现以采用化学方法处理者质量最佳。
