电介质薄膜,thin dielectric film
1)thin dielectric film电介质薄膜
1.Size effect of the thermal conductivityacrossthin dielectric films;电介质薄膜导热系数的尺寸效应
2.Non equilibrium molecular dynamics (NEMD) simulations have been performed to explore the normal thermal conductivity of nanoscalethin dielectric films.通过非平衡分子动力学 (NEMD)模拟预报了纳米电介质薄膜的法向导热系数 。
英文短句/例句
1.Research on the Fabrication of High-k Dielectric Films and the Discussion of Integrated Thin Film Capacitor;高k电介质薄膜制备研究与集成薄膜电容探讨
2.Energy normalized photon-stimulated discharge spectra of polymer dielectric film聚合物电介质薄膜的能量归一化光激电流谱
3.film dielectric variable capacitor薄膜介质可变电容器
anic film capacitor有机薄膜介质电容器
5.Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film高介电栅介质ZrO_2薄膜的物理电学性能
6.film dielectric four-gang variable capacitor薄膜介质四连可变电容器
7.film super-small variable capacitor薄膜介质超小型可变电容器
8.Investigation on preparation,Structure and dielectric properties of amorphous fluorinated carbon films;α-C：F薄膜的沉积、结构与介电性质研究
9.Preparation and Photoelectric Properties of TiO_2 Mesoporous Thin FilmsTiO_2介孔薄膜的制备及其光电性质研究
10.We can classify thin films into four groups:thermal oxides,dielectric layers,polycrystalline silicon, and metal films.我们可以把薄膜分成四组：热氧化物，介电质层，多晶硅，金属薄膜。
11.Thermal stability and electrical properties of high-k LaErO_3 films作为高介电常数栅介质材料的LaErO_3薄膜热稳定性和电学性质的研究
12.anodized dielectric film阳极氧化的介质薄膜
13.Research on Non-linear Dielectric Properties of STO Thin Films and Its Microwave Applications;STO薄膜的非线性介电性质及其微波应用研究
14.Investigation on Deposition Conditions and Properties of Fluorocarbon Films by Dielectric Barrier Discharge;介质阻挡放电法氟碳薄膜制备工艺及性能研究
15.Study on Coplanar Barrier Discharge and Its Application to Fabricating Thin Films;共面介质阻挡放电应用于薄膜制备的研究
16.Dielectric Property of Sol-gel Derived Ba_xSr_(1-x) TiO_3(BST) Film;溶胶凝胶法制备的钛酸锶钡薄膜的介电性质
17.Study on Anti-UV Transparent Metal/Dielectric Composite Films with High Conductivity抗紫外、高导电率、透明金属/介质复合薄膜的研究
18.Preparation and Ultraviolet Photoelectric Response of TiO_2 Mesoporous Thin FilmsTiO_2介孔薄膜的制备及紫外光电响应性质
相关短句/例句
dielectric film电介质薄膜
1.A newdielectric film-SiOP was grown on InGaAsP/InP multi-quantum wells (MQW) structure by plasma enhanced chemical vapor deposition (PECVD).用等离子体增强化学沉积(PECVD)方法制备了一种新的电介质薄膜—SiOP,用X射线光电子谱(XPS)和光荧光(PL)研究了膜的结构及膜对1。
3)thin film dielectric薄膜电介质
4)High-k dielectric films高k电介质薄膜
1.research ofHigh-k dielectric films for MOS gate dielectric applications;b.本文第一部分以溅射沉积SiO_xN_y、TiO_2等高k电介质薄膜为研究主题,研究了溅射工艺对薄膜成分、结构的影响;并以MOS电容栅介质为应用背景,对薄膜电学性能进行了讨论。
5)Dielectric film介质薄膜
1.In this paper, a theoretical model of long-pulse laser leading to thermal stress damageof dielectric film in film/substrate systems is developed.本文用有限元法研究并建立了长脉冲激光对介质薄膜热应力损伤的理论模型，在该模型的基础上模拟了介质薄膜和基底中的温度场和热应力场瞬态分布，分析了长脉冲激光对介质薄膜的热应力损伤的机理。
2.The damage mechanisms and characteristics of dielectric films under the irradiation of the long pulse laser are studied in this paper.本文从理论和实验方面研究了长脉冲激光对介质薄膜的损伤机理和特性,并对波长为1064nm的长脉冲激光产生的损伤阈值进行了测试研究。
6)dielectric thin films介质薄膜
延伸阅读
液体电介质电击穿液体电介质电击穿breakdown in dielectric liquids丫e们d{0川旧7日妇ch日on液体电介质击穿(b reakdownindielectricliquids)在电场作用下，液体电介质由绝缘状态突变为良导电状态的过程。液体电介质击穿过程的试验研究还不很充分，全面描述液体电介质击穿的理论尚未形成。对于纯净的液体电介质，存在两种用来解释击穿过程的理论—电击穿理论(见液体电介质电击穿)和气泡击穿理论(见液休电介质气泡击穿)。对于或多或少含有水分、纤维等杂质的工程用液体电介质的击穿过程，可用小桥击穿理论(见液体电介质小桥击穿)解释二
