介质薄膜,Dielectric film
1)Dielectric film介质薄膜
1.In this paper, a theoretical model of long-pulse laser leading to thermal stress damageof dielectric film in film/substrate systems is developed.本文用有限元法研究并建立了长脉冲激光对介质薄膜热应力损伤的理论模型，在该模型的基础上模拟了介质薄膜和基底中的温度场和热应力场瞬态分布，分析了长脉冲激光对介质薄膜的热应力损伤的机理。
2.The damage mechanisms and characteristics of dielectric films under the irradiation of the long pulse laser are studied in this paper.本文从理论和实验方面研究了长脉冲激光对介质薄膜的损伤机理和特性,并对波长为1064nm的长脉冲激光产生的损伤阈值进行了测试研究。
英文短句/例句
1.anodized dielectric film阳极氧化的介质薄膜
2.Study of Mechanical and Optical Characteristic in Film/substrate System for Dielectric Thin Film;介质薄膜膜基体系力学光学特性研究
3.Research on the Fabrication of High-k Dielectric Films and the Discussion of Integrated Thin Film Capacitor;高k电介质薄膜制备研究与集成薄膜电容探讨
4.Interface roughness of multilayer dielectric optical thin film多层介质薄膜膜层间界面粗糙度及光散射
5.A Report on the Study of Planar Optical Waveguides on Thin Dielectric Film with Step Index Profile阶跃折射率介质薄膜平面光波导研制报告
6.Optical Dielectric Thin Film Working under Ultrashort Pulse;工作在超短脉冲条件下的光学介质薄膜
7.Study on Preparation and Properties of CMN/CT Microwave Dielectric Film by Pechini Method;Pechini方法制备CMN/CT微波介质薄膜及性能研究
8.Calculating Methods of Multi-Coat Films;多层介质薄膜的相干和非相干计算方法
9.film dielectric variable capacitor薄膜介质可变电容器
anic film capacitor有机薄膜介质电容器
11.Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film高介电栅介质ZrO_2薄膜的物理电学性能
12.film dielectric four-gang variable capacitor薄膜介质四连可变电容器
13.film super-small variable capacitor薄膜介质超小型可变电容器
14.Investigation on preparation,Structure and dielectric properties of amorphous fluorinated carbon films;α-C：F薄膜的沉积、结构与介电性质研究
15.Preparation and Photoelectric Properties of TiO_2 Mesoporous Thin FilmsTiO_2介孔薄膜的制备及其光电性质研究
16.Tribological Properties of CrN_X Films in Different Tribological Conditions不同介质下CrN_X薄膜的摩擦学特性研究
17.We can classify thin films into four groups:thermal oxides,dielectric layers,polycrystalline silicon, and metal films.我们可以把薄膜分成四组：热氧化物，介电质层，多晶硅，金属薄膜。
18.Thermal stability and electrical properties of high-k LaErO_3 films作为高介电常数栅介质材料的LaErO_3薄膜热稳定性和电学性质的研究
相关短句/例句
dielectric thin films介质薄膜
3)dielectric thin film介质薄膜
1.There are many kinds of the moderndielectric thin films in common use, which are classified according to their compositions as three:inorganic,organic and combined.介质薄膜是一类重要的电子薄膜。
2.To understand thermodynamically the influence of spheroidal impurities on the laser damage of optical thin film,FEM was used to simulate how the thermal absorption of spheroidal impurities affects the temperature field distribution in a 500nm-thickdielectric thin film under laser irradiation,based on the heat transfer equations.在介质薄膜中,薄膜中的嵌入杂质或缺陷是导致薄膜激光损伤的关键因素。
4)medium film介质薄膜
1.A layer ofmedium film is plated on the surface of such devices (called film of increasing transmission or FIT) in order to reduce the loss of surface reflection.在光学器件中,由于器件(如透镜、棱镜)表面的反射作用而使光能损失,为了减少光学器件表面的反射损失,常在器件表面镀上一层透明介质薄膜(称为增透膜),增透膜的效果与介质薄膜的折射率、厚度等相联系。
5)thin dielectric film薄介质膜
1.Experimental study of breakdown characteristic ofthin dielectric film in nanometre range formed by low temperature PECVD;PECVD法低温形成纳米级薄介质膜击穿特性的实验研究
6)rubber thin layer薄膜介质
延伸阅读
二氧化硅薄膜介质材料分子式：SiO2CAS号：性质：一种高纯氧化膜。具有介电性能稳定、耐潮性好、电容温度系数小和介质损耗角正切值小等优点。介电常数3.67～5.90，tgδ<2×10-4，击穿电压大于50V。采用电子束蒸发法、射频溅射法、热氧化法等制取，主要用于制作半导体混合集成电路和薄膜集成电路的MOS电容器和隔离绝缘层等。
