碳离子注入,carbon ion implantation
1)carbon ion implantation碳离子注入
1.In order to study the effect ofcarbon ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with carbon ions with fluence ranging from 1×1016 ions/cm2 (1E16C) to 1×1017 ions/cm2, using a metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV.为了研究碳离子注入对纯锆耐蚀性的影响,用MEVVA源对纯锆样品进行了1×1016ions/cm2至1×1017ions/cm2的碳离子注入,注入加速电压为40kV。
2.This paper reports the effects ofcarbon ion implantation at 100 keV and 10 15 /cm 2 on the seed germination rate, development, growth, and chloroplast structure of Stevia rebaudiana seedling.表明该能量剂量的碳离子注入将影响种子的生长发育，其原因之一是叶绿体发育迟缓和叶绿体的损伤。
英文短句/例句
1.The Study on Surface Modification by Mg/C Ion Implantation into Titanium;镁/碳离子注入医用纯钛表面改性的研究
2.Influence of C~+ -implanted energy on tribological behaviour of silicon碳离子注入能量对硅表面摩擦性能的影响
3.Influence of the C~+-implantation on the Adhesion Properties of Silicon Wafer Surface碳离子注入对硅片表面黏附性能的影响
4.Anti wear property of GCr15 steel deposited with Ta film and implanted with C ionsGCr15表面钽沉积及碳离子注入的摩擦性能的研究
5.Mutation breeding of citric acid-producing strain by Fe and C ions implantation铁离子和碳离子注入诱变柠檬酸生产菌的初步探讨
6.The study of performances and structures of Ti doped DLC films钛离子注入类金刚石碳膜的结构与性能的研究
7.Investigation on Surface Nanocrystallization and Ion Implantation of Q235 Low Carbon Steel;Q235低碳钢表面纳米化及离子注入的研究
8.Investigation of Silver Ions Implanted to Medical Pyrolytic Carbon on Antibacterial Properties;银离子注入医用热解碳抗菌性能的研究
9.mos ion implantationmos结构离子注入
10.Optical properties revealing annealing behavior of high-temperature He-implantation induced defects in silicon carbide碳化硅中氦离子高温注入引入的缺陷及其退火行为的光谱研究
11.bipolar ion implantation双极型掐用离子注入
12.implant masking step离子注入用掩蔽工序
13.high output implanter高功率离子注入装置
14.rod plasma injector棒状等离子体注入器
15.ion implantation gate MOS integrated circuit离子注入ＭＯＳ集成电路
16.ion implanted fet离子注入场效应晶体管
17.ion implanted base transistor离子注入基极晶体管
18.amorphous implantation对非晶半导体离子注入
相关短句/例句
C+ion beam implantation碳离子束注入
3)ion implantation离子注入
1.Study on characteristics and technology ofion implantation-assisted electroless copper plating films on Al_2O_3 ceramics;离子注入辅助Al_2O_3陶瓷表面化学镀镀层特性研究
2.Application ofion implantation and D-gun spraying technology to improve Operation life for jet element of fluid efflux hammer;应用离子注入和爆炸喷涂技术提高液动锤射流元件寿命
3.Application of low energyion implantation in breeding of high yield CGTase strains;低能离子注入在CGTase高产菌株选育中的应用
4)Ion-implantation离子注入
1.Substituting Epitaxy byIon-implantation in the Production of Microphone Devices;改用离子注入替代外延生产话筒管
2.Study on ion-implantation induced intermixing effect of quantum wellby using photoluminescence spectroscopy;离子注入诱导量子阱界面混合效应的光致荧光谱研究
3.Using single energy or overlapped energy ion-implantation technology,a modified layer was formed after C ions implanted into uranium.利用离子注入技术,分别采用单能量和多能量叠加注入方式在铀表面注入碳形成表面改性层,并对改性层的形貌、注入元素的分布和相结构分别进行扫描电镜(SEM)、俄歇电子能谱(AES)及表面相结构衍射谱(XRD)分析,利用电化学极化法测试注入样品的抗腐蚀性能。
5)implantation[英][,implɑ:n"tei??n][美][,?mpl?n"te??n]离子注入
1.Ion-implantation-induced transformation and pyrochlore nanodomains in a single crystal YSZ;离子注入诱发YSZ相变和Pyrochlore纳米晶的电子显微研究
2.Ion Implantation in Fabricating Strained Si Channel CMOS;应变Si沟道CMOS中的离子注入工艺
3.The structure of the aluminum alloy LY12 implanted with N/Ti by plasma based ionimplantation (PBII) was characterized using X ray photoelectron spectroscopy (XPS) and glancing X ray diffraction (GXRD).用X射线光电子能谱 (XPS)和小掠射角X射线衍射 (GXRD)研究了铝合金LY12等离子体基离子注入氮 /钛改性层的结构。
6)Ions implantation离子注入
1.It is analyzed that range distribution and energy deposition distribution of 15 keV nitroger or argon ions implantation in polyether sulfone film.计算了 1 5 ke V N+和 Ar+注入聚醚砜薄膜的射程分布和能量淀积分布 ,利用计算的结果说明了离子注入聚醚砜膜后 ,薄膜表面电导率增加 (增加 5个数量级 )和光吸收率增加 (最大吸收率从44%增加到 82 。
2.In this paper, the biological features of saccharomycse stour implanted with low energy ion-beams are studied, and the parameters for ions implantation are established.研究了以低能离子注入为手段 ,来选育斯托尔酒精酵母 。
3.Changes in structure and property of tool and mould steel by matallic ions implantation was analyzed in this paper.对金属离子注入工模具钢造成的结构及性能的变化进行了分析 ,并对其强化机理进行了讨论。
延伸阅读
离子注入（ionimplantation）离子注入（ionimplantation）用离子加速器将各种离子注入半导体材料，从而改变半导体材料的电学、光学或其他物理性质的半导体工艺技术，称为离子注入技术。自从20世纪70年代以来离子注入技术在半导体器件制备工艺中获得了广泛应用，是半导体器件工艺的最主要技术之一。
