痕量杂质,Trace impurities
1)Trace impurities痕量杂质
1.Determination of trace impurities in In_2O_3-SnO_2(ITO) ultrafine composite pow der by ICP-AES;ICP-AES法测定氧化铟-氧化锡(ITO)超细复合粉末中的痕量杂质
2.A method for the determination of trace impurities in high purity gallium by inductively coupled plasma mass spectrometry (ICP MS) was developed.采用电感耦合等离子体质谱 (ICP MS)测定高纯镓中痕量杂质元素 ,以Rh作为内标补偿校正镓基体的抑制效应 ,采用异丙醚萃取分离镓与ICP MS技术联用 ,拓展分析方法应用范围 ,可满足99 9999%～ 99。
3.Objective: To establish a micellar electrokinetic chromatography (MEKC) method with the online sweeping technique to determine trace impurities in nateglinide.目的:利用胶束电动毛细管色谱在线推扫富集技术建立测定那格列奈原料中痕量杂质的方法。
英文短句/例句
1.Ments in Hich-purity WO_3 by Spectrographic Analysis;高纯三氧化钨中20种痕量杂质元素的光谱分析
2.The research of temperature-changing condensation equipment and method for determination of trace impurities in high purity hydrogen高纯氢中痕量杂质变温浓缩装置及方法
3.Determination of Impurity Elements in High Purity Graphite by Inductively Coupled Plasma-Mass SpectrometryICP-MS法测定高纯石墨中的痕量杂质元素
4.Determination of the impurity elements in high purty gold using ICP-AES method after matrix extraction by ethyl acetate乙酸乙酯萃取—ICP-AES测定高纯金中的痕量杂质
5.Determination of Cu,Zn,Pb,Cd and Ni in muddy soil by ICP-AESICP-AES法测定污泥中痕量杂质元素铜、锌、铅、镉、镍
6.Atomic Spectrometric Determination of Impurities in Pure Tungsten and Components in Tungsten-based Alloys原子光谱分析法测定纯钨中痕量杂质和钨基硬质合金中组成元素
7.Determination of Impurity in Nategl inide by On -line Sweeping Technique in MEKC;胶束电动色谱在线富集技术测定那格列奈中的痕量杂质
8.A New Trace Impurity Gas Chromatography Analysis Method for SF_6 New Gas and Recommended Standard of SF_6 New Gas for Electric Power IndustrySF_6新气痕量杂质气相色谱分析新方法与电力行业SF_6新气推荐标准
9.Determination of Impurity Elements in High Purity Graphite by ICP-MS after Mixture Acid Digestion in Reflux Condenser System冷凝回流三酸体系消解—ICP-MS法测定高纯石墨中的痕量杂质元素
10.Determination of Trace Amounts of Elements in High Purity Titanium by Ion-Exchange Chromatography and Inductively Coupled Plasma-Mass Spectrometry离子交换色谱-电感耦合等离子体质谱法测定高纯钛中痕量杂质元素
11.A Removal of Trace Silicon Impurity from Aluminum Isopropoxide;异丙醇铝中痕量硅杂质分离纯化研究
12.Simultaneous Determination of Trace Metallic and Non-Metallic impurities in Ultra-Pure Water by ICP Spectrometry超纯水中痕量金属和非金属杂质的同时测定
13.Study on the Determination of Trace Amounts of Metal Impurities in High Purity Silver Nitrate;高纯硝酸银中痕量金属杂质的测定研究
14.Determination of 14 trace rare earth impurities in high-purity europium oxide by inductively coupled plasma mass spectrometry with membrane desolvation膜去溶-ICP-MS法测定高纯Eu_2O_3中14种痕量稀土杂质
15.Detection of the Trace Impurity in Ethylmaltol by ESI TOF MS电喷雾飞行时间质谱分析乙基麦芽酚中的痕量“杂质”
16.NF3 is a colorless gas. Trace quantities of impurities can impart a musty or pungent odor to the gas.)NF3是无色气体。痕量的杂质会使气体带有一种霉味或刺激性气味。
17.Determination of Trace As and Se in Complex Matrix Sample by Inductively Coupled Plasma-Mass Spectrometry with O_2 Collision/Reaction Cell等离子体质谱-氧气碰撞池技术测定复杂基体样品中痕量砷和硒
18.Determination of 14 Trace Rare Earth Impurities in High-Purity CeO_2 by Inductively Coupled Plasma Mass Spectrometry with Membrane Desolvation膜去溶-ICP-MS测定高纯CeO_2中14种痕量稀土杂质分析方法研究
相关短句/例句
trace impurity痕量杂质
1.A standard addition method is used to determinate the fivetrace impurity elements through ICP-OES and effects of various conditions are tested.建立了一种电感耦合等离子体发射光谱仪(ICP-OES)测定钛白粉中痕量杂质铁、钴、镍、铜和锰的方法。
2.In this work,an on -line sweeping technique for the determination oftrace impurity in nateglinide by using SDS buffer solu tion was developed.利用在线推扫富集技术建立了毛细管电色谱测定新药那格列奈中痕量杂质的方法。
3.A method was developed for the determination oftrace impurity affecting ultraviolet transmittance in ethylene glycol.建立了测定乙二醇中影响紫外透光率的痕量杂质的方法。
3)impurity elements痕量杂质
1.ICP-MS was utilized to determine theimpurity elements including Li、Be、Ti、V、Cr、Mn、Ni、Co、Cu、Ga、Sr、Y、Zr、In、Sb、Ba、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Bi.5%,该法适用于高纯石墨中痕量杂质元素的测定。
2.The method of determination of 35 traceimpurity elements in high purity graphite was established.该方法适用于高纯石墨中痕量杂质含量的测定。
4)Trace impurity yttrium痕量杂质钇
5)trace impurity微(痕)量杂质
6)ultratrace impurity超痕量杂质
延伸阅读
超痕量分析分子式：CAS号：性质：分析化学中对试样待测物质浓度低于10-6，即<1μg/g时，各种分析方法的测定限。
