电子束蒸发,electron beam evaporation
1)electron beam evaporation电子束蒸发
1.Photoelectrical properties and microstructure of ITO films prepared byelectron beam evaporation;电子束蒸发技术制备ITO薄膜的光电特性和微结构研究
2.Characteristic study of nano ZnO films prepared byelectron beam evaporation;电子束蒸发制备纳米ZnO薄膜及其特性研究
3.Roughness and light scattering properties of ZrO_2 thin films deposited byelectron beam evaporation;电子束蒸发氧化锆薄膜的粗糙度和光散射特性
英文短句/例句
1.Characterization and Preparation of PbI_2 Thin Films Grown by Electron Beam Evaporation电子束蒸发制备PbI_2薄膜及其性能表征
2.Study of the Optical and Electrical Characteristics of Aluminum-doped ZnO Thin Films Prepared by Electronic Beam Evaporation;电子束蒸发制备AZO薄膜的光电性能研究
3.Prepared TiN Thin Films by LTP Enhanced Electronic Beam Evaporation;低温等离子体增强电子束蒸发沉积TiN的研究
4.Study of Oxide Optical Films Deposited by Bias-Voltage E-Beam Evaportation;偏压电子束蒸发沉积氧化物光学薄膜研究
5.Study of the Deposition and Optical Properties of TiO_2 Thin Films Deposited by Electronic Beam Evaporation;电子束蒸发制备TiO_2薄膜及光学性能的研究
6.The surface analysis of the c-BN film with electron beam method电子束蒸发制备立方氮化硼薄膜的表面分析
7.Study Of Stress in TiO_2 films grown by electron-beam evaporation电子束蒸发制备二氧化钛薄膜的应力研究(英文)
8.Preparation of Si_(0.95)Co_(0.05) DMS films by Electron Beam Evaporation Technology电子束蒸发制备Si_(0.95)Co_(0.05)稀磁半导体薄膜
9.Fabrication and Surface Analysis of Boron Carbide Thin Films by Electron Beam Evaporation碳化硼薄膜的电子束蒸发制备及表面分析
10.IR Spectra Characteristics of Boron Nitride Thin Films Deposited by Electron Beam Evaporation电子束蒸发制备氮化硼薄膜的红外光谱研究
11.Growth and Characterization of CdS Polycrystalline Films by Electron Beam Evaporation电子束蒸发制备CdS多晶薄膜及性质研究
12.A full automatic UHV e-beam evaporation control system for thin film growth一种全自动超高真空电子束蒸发薄膜生长系统
13.Influence of oxygen partial pressure on residual stresses of TiO_2 films prepared by electron beam evaporation氧分压对电子束蒸发TiO_2薄膜残余应力的影响
14.Influence of substrate temperature on properties of ZnS films prepared by electron-beam evaporation基片温度对电子束蒸发的ZnS薄膜性能的影响
15.The research of the fabrication of Al/Al_2O_3/Al superconductor tunnel junctions by electron beam vapour利用电子束蒸发制备铝隧道结工艺研究
16.Ion Beam Bombardment and Variations in Stress of TiO_2 Films离子束轰击对电子束蒸发制备二氧化钛薄膜应力的影响
17.Preparation of WO_3 & NiO_x Films by Electron Beam Evaporation & Research on Electrochromic Smart Window;电子束蒸发氧化钨、氧化镍薄膜的制备与电致变色智能窗的研究
18.Electrical Properties of Indium Tin Oxide Thin Films Prepared by Electron Beam Evaporation氧化铟锡薄膜的电子束蒸发制备及其电学性质的研究
相关短句/例句
E-beam evaporation电子束蒸发
1.Fabrication and properties of p-CuAlO_2 films by e-beam evaporation;电子束蒸发制备CuAlO_2透明导电膜及光学性质
2.A full automatic UHV e-beam evaporation control system for thin film growth一种全自动超高真空电子束蒸发薄膜生长系统
3.The work on fabrication of MgB_2 superconducting thin films via E-Beam evaporation approach is reported.报道了采用电子束蒸发技术实现MgB2薄膜制备的实验工作。
3)electron-beam evaporation电子束蒸发
1.Influence of substrate temperature on properties of ZnS films prepared byelectron-beam evaporation基片温度对电子束蒸发的ZnS薄膜性能的影响
2.The Si/Co/Cu/Co multilayers are prepared by the ultra-high vacuumelectron-beam evaporation on the Si(100) substrate.用超高真空电子束蒸发方法在S i(100)衬底上制备了S i/Co/Cu/Co多层膜。
3.With Al_2O_3 film deposited byelectron-beam evaporation as an example, the technique of dielectric film wasintroduced.以Al_2O_3薄膜为例,介绍了用电子束蒸发制备介质薄膜的工艺。
4)electron beam evaporation plating电子束蒸发镀
1.In this present paper,the operation technology for preparation of aluminium-chromium alloy coating byelectron beam evaporation plating was studied.研究了电子束蒸发镀沉积Al-Cr合金涂层的工艺 ,探讨了铬含量对涂层耐蚀性的影响 ,对涂层的物相、形貌以及热处理对涂层和基体之间热扩散的影响进行了分析 。
5)Electron-beam evaporation电子束蒸发沉积
6)Electron beam evaporation电子束热蒸发
1.Using pure ZnO and TiO2 grains,ZnO/TiO2 thin films were fabricated on Si substrates by electron beam evaporation method in O2 environment.利用电子束热蒸发镀膜的方式,以高纯度的ZnO和TiO2颗粒为原料,以Si为基底在有氧的气氛中制备ZnO/TiO2复合薄膜。
延伸阅读
电子束蒸发（electron-beamevaporation）电子束蒸发（electron-beamevaporation）电子束蒸发是一种清洁的金属薄膜淀积工艺。由热丝发射的电子经过聚焦、偏转和加速以后形成能量约为10keV的电子束，然后轰击放在有冷却水套的容器中的金属并使之蒸发。蒸发的金属在置于附近的衬底（如硅片）上淀积，从而获得有一定厚度的金属镀层。电子束蒸发具有沾污轻和适用范围广的优点，但不适用于多元合金及易被电子束分解的化合物。铝受电子束轰击激发出的特征X射线会对器件造成损伤。电子束还可能使真空室内残余气体和一部分蒸发的金属原子电离。电子束蒸发在半导体集成电路中的主要应用是引线金属化层的淀积。
